Two of the approaches electronic-photonic circuit simulations can account for Monte Carlo course of parameter variations in the course of the design stage.

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Silicon photonics (SiPh) refers back to the enablement of photonic built-in circuits (PIC) over silicon wafer. SiPh allows compatibility with current CMOS manufacturing infrastructure for large-scale integration and brings the related advantages to the photonics, particularly, decrease footprint, decrease thermal results, and co-packaging of electronics and photonics on the identical chip. One of many side-effects of nanometer regime scaling in fashionable semiconductor applied sciences is that the impression of native (i.e., inside die) variations has elevated; and, efforts to scale back manufacturing variations can impose capital-intensive penalties. With the method nodes turning into smaller, nook design approaches, usually utilized in digital (digital) designs, alone aren’t enough. That is very true for the photonic designs that are extra analog-like. Because of this, PIC designers are tasked with the inclusion of stochastic nature of course of variations into their design course of and discovering methods of minimizing the impression. Course of parameter variations could be included as a part of the electronic-photonic design automation (EPDA) in Synopsys OptoCompiler-OptSim. We start by a high-level classification of course of variations. Subsequent, we describe two of the approaches electronic-photonic circuit simulations can account for Monte Carlo course of parameter variations in the course of the design stage. Two case research are introduced as illustrations of every method.

Creator:
Jigesh Okay. Patel
Technical Advertising and marketing Supervisor,
Customized Design and
Manufacturing
Group, Synopsys

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